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Pevonia Purifying Skin Mask has a high concentration of active ingredients such as: Glycolic Acid, Zinc Oxide, Sulfur, and Camphor, this mask delivers healing, soothing, purifying, and tightening benefits. It works as an antiseptic and serves as a bacteria suppressor.
Apply mask to clean skin. Avoid the eyes. Leave on for 10 minutes, then rinse thoroughly. Pat dry.
Water, Glycerin, Bentonite, Glyceryl Stearate, Zinc Oxide, Glycolic Acid, Salicylic Acid, Aloe Barbadensis Leaf Gel, Panthenol, Sulfur, Anthemis Nobilis (Chamomile) Flower Oil, Cinnamomum Camphora (Camphor) Wood Extract, Phenoxyethanol, Dimethicone, Methylisothiazolinone