Osmosis is a premier skincare brand that creates a range of top-quality facial products which are safe even on the most sensitive skin types due to their nutrient-infused and highly efficient yet non-inflammatory nature. While most skincare companies have been smothering their products with irritating ingredients (that work by inflaming the skin) for decades, Osmosis Skincare products have been striving to change the trend. The brand believes it has to adopt holistic skincare techniques to achieve reverse skin aging. Osmosis is the preferred choice of several knowledgeable and experienced skincare experts for the following reasons:
- A majority of the world's skincare companies struggle to reach adequate penetration and therefore have been unable to tackle issues related to lack of skin nutrition and tissue repair process.
- Osmosis Skincare products, on the other hand, distinguish themselves by utilizing the most sophisticated skincare ingredients in the world. They are the planet's first skincare brand to offer DNA repair techniques using Zinc Finger Technology and also liposomally delivered stem-cell growth strategies. Osmosis also has the distinction of possessing over 17 pending patents for ingredients which have the ability to improve the quality of one's skin gently, naturally and effectively, without dousing the skin with reactive chemicals. It is the first company that is actively discussing and researching trends on enhancing skin nutrition and preparing multiple modalities to achieve this healthy skincare objective.
- Osmosis achieves exceptional results based on its ability to address every aspect of skin damage in-depth. Loss of skin nutrition, DNA damage, scar tissue, skin growth factors and build-up are all considered and effectively tackled while conceptualizing products under the Osmosis skincare brand. In addition to this, the holistic skincare brand stays clear of ingredients and techniques that cause the skin to weaken or inflame.
* PLEASE NOTE: Osmosis products cannot be shipped outside the US.